Herstellungsverfahren einer Zusammensetzung zur Herstellung einer dünnen Schicht mit niedrigem Brechungsindex, und Verfahren zur Herstellung einer dünnen Schicht mit niedrigem Brechungsindex

Details

Veröffentlichungs-Nr.

EP2937319

Aktenzeichen

EP14166093

Anmeldetag

25. April 2014

Veröffentlichung

12. September 2018

Erteilung

12. September 2018

Rechtsraum

EP

IPC

C03C17/00C03C17/30C09D183/04C09D183/08C08G77/24C09D5/00C08L83/04C08L83/08G02B1/11G02B27/00

Abstract

[Task] To provide a low refractive index film-forming composition for forming a low refractive index film which has a low refractive index, produces a strong antireflection effect, exhibits excellent adhesiveness with respect to a substrate, and is excellent in water repellency or antifouling properties of the coat surface; a production method of the composition; an a method for forming a low refractive index film. [Means for Resolution] The low refractive index film-forming composition is prepared by generating a hydrolysate of (A) a silicon alkoxide by mixing the (A) silicon alkoxide with (B) water, (C) an inorganic acid or an organic acid, and (D) an organic solvent at a predetermined ratio, and mixing the hydrolysate with (E) silica sol, which is obtained by dispersing fumed silica particles in a liquid medium, at a predetermined ratio.

Anmelder

Firma

Mitsubishi Materials Corporation

Land

🇯🇵 Japan

Fachgebiete