Katadioptrisches Abbildungssystem für die Euv-Projektionslithographie

Details

Veröffentlichungs-Nr.

EP3023824

Aktenzeichen

EP15195078

Anmeldetag

18. November 2015

Veröffentlichung

2. Januar 2019

Erteilung

2. Januar 2019

Rechtsraum

EP

IPC

G02B13/22G03F7/20G02B17/06G02B5/08G02B26/02G21K1/02G21K1/06// G02B5/00

Abstract

Imaging optical unit (7) for EUV projection lithography and comprising a plurality of mirrors (M1-M4) imaging an object field (4) onto an image field (8) and a circular aperture stop (18) tilted by at least 1° with respect to a plane (17) that is perpendicular to the optical axis (oA, xz-axis). The difference, averaged over the whole field, between the numerical aperture NA x measured in the xz-plane and the numerical aperture NA y measured in the yz-plane is smaller than 0.003. This imaging optical unit (7) achieves an homogenization of the image-side numerical aperture while keeping a high resolution in the image plane independently of the orientation of the incidence plane in the image field (8).

Anmelder

Firma

Carl Zeiss SMT GmbH

Land

🇩🇪 Deutschland

Fachgebiete