Verfahren zur Strukturierung einer Unterschicht
Anmelder: IMEC VZW 🇧🇪
Details
- Veröffentlichungs-Nr.
- EP3062334
- Aktenzeichen
- EP15157046
- Anmeldetag
- 27. Februar 2015
- Veröffentlichung
- 5. August 2020
- Erteilung
- 5. August 2020
- Rechtsraum
- EP
- IPC
- H01L21/033
Abstract
A method for patterning an underlying layer is described, the method comprising - providing a guiding layer on the underlying layer, the guiding layer comprising guiding structures and being substantially planar; - providing a block-copolymer layer on the guiding layer; - inducing phase separation of the block-copolymer layer in a regular pattern of structures of a first and a second polymer component, whereby one of the components aligns to the guiding structures, by chemo-epitaxy; - thereafter, removing a first of the components of the block-copolymer layers completely, leaving a regular pattern of structures of the second component; - providing a planarising layer over the regular pattern of structures of the second component and the guiding layer; - removing a portion of the planarising layer, thereby leaving a regular pattern of structures of the planarising layer at positions in between the structures of the second component, and exposing the structures of the second component; - removing the structures of the second component, selectively with respect to the structures of the planarising layer; - patterning the underlying layer, thereby using the structures of the planarising layer as a mask.
Anmelder
- Firma
- IMEC VZW
- Land
- 🇧🇪 Belgien
Imec ist ein belgisches Forschungszentrum mit Sitz in Leuven, das auf Nanoelektronik, Halbleitertechnologie und digitale Technologien spezialisiert ist.
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