Verfahren zur Herstellung von Substraten
Anmelder: Shin-Etsu Chemical Co., Ltd. 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP3093105
- Aktenzeichen
- EP16169066
- Anmeldetag
- 10. Mai 2016
- Veröffentlichung
- 24. Juni 2020
- Erteilung
- 24. Juni 2020
- Rechtsraum
- EP
- IPC
- B24B37/10B24B37/04B24B37/08B24B7/22B24B7/24
Abstract
Proposed herein is a method for producing substrates, particularly those of synthetic quartz glass, while saving the substrate surface from killer defects without resorting to any large-scale apparatus and precision polishing plate, thereby reducing defectives and improving yields more than in production with conventional facilities. The method for producing substrates by polishing, includes steps of placing substrate stocks individually in work holes formed in a carrier on a lower polishing plate, bringing an upper polishing plate into contact with the surface of the substrate stocks, with the surface of the substrate stocks being coated with an impact-absorbing liquid and the lower polishing plate being rotated, and rotating the upper and lower polishing plates, with the surface of the substrate stocks being accompanied by a polishing slurry.
Anmelder
- Firma
- Shin-Etsu Chemical Co., Ltd.
- Land
- 🇯🇵 Japan
Japanisches Chemieunternehmen mit Sitz in Tokio. Shin-Etsu Chemical stellt Siliziumwafer für Halbleiter, Silikonprodukte, PVC und weitere Spezialchemikalien für Elektronik-, Bau- und Industrieanwendungen her.
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