Verfahren zur Verifizierung eines Musters von Merkmalen, die von einem Lithografieverfahren Gedruckt Wurden

Details

Veröffentlichungs-Nr.

EP3133553

Aktenzeichen

EP15181276

Anmeldetag

17. August 2015

Veröffentlichung

4. August 2021

Erteilung

4. August 2021

Rechtsraum

EP

IPC

G06T7/00G03F1/70

Abstract

The invention is related to a method for verifying a printed pattern comprising polygon-shaped features (1-7) as printed by a lithographic tool using a lithographic mask, wherein a number of sectors of features of the pattern are first defined, and wherein the surface area of these sectors is used for calculating one or more parameters that express the print quality of the features, said parameters being suitable for determining a process window. The surface area of the sectors is determined on a contour of the printed pattern, obtainable from an CD-SEM image of the printed pattern. According to preferred embodiments, the parameters are ratios of surface area-based values divided by reference values. The reference values may be determined on the basis of the design intent of a pattern or on the basis of a contour extracted from a simulated print of the pattern.

Anmelder

Firmen

IMEC VZW
Katholieke Universiteit Leuven

Land

🇧🇪 Belgien

Fachgebiete