Fotomaskenrohling

Details

Veröffentlichungs-Nr.

EP3139211

Aktenzeichen

EP16184791

Anmeldetag

18. August 2016

Veröffentlichung

12. Februar 2020

Erteilung

12. Februar 2020

Rechtsraum

EP

IPC

G03F1/20G03F1/26G03F1/32G03F1/50G03F1/54G03F1/80

Abstract

A photomask blank comprising a transparent substrate (1) and a chromium-containing film (2) is provided. The chromium-containing film is constructed by one or more chromium compound layers which are formed of a chromium compound containing Cr, N and optionally O, and have a composition having a Cr content ≥ 30 at% and a total Cr+N+O content ≥ 93 at%, and meeting the formula: 3Cr ≤ 20 + 3N. A chromium compound layer meeting a first composition having an N/Cr atomic ratio ≥ 0.95, a Cr content ≥ 40 at%, a total Cr+N content ≥ 80 at%, and an 0 content ≤ 10 at% is included to a thickness of more than 70% to 100% of the overall thickness of the chromium-containing film.

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete