Inspektionsvorrichtung und Inspektionsverfahren

Details

Veröffentlichungs-Nr.

EP3206020

Aktenzeichen

EP17155554

Anmeldetag

10. Februar 2017

Veröffentlichung

8. November 2017

Rechtsraum

EP

IPC

G01N21/95H01L21/66G01N21/3586H02S50/10

Abstract

An inspection apparatus 100 inspects an insulating film 93 formed on a surface of an inspection sample 9 mainly made of a semiconductor material. The inspection apparatus 100 includes: a stage 30 that retains the inspection sample 9; a light irradiator 10 that irradiates the inspection sample 9 with light LP11 having a predetermined wavelength to cause the inspection sample 9 to emit a terahertz wave LT1: a detector 20 that detects electric field intensity of the terahertz wave LT1 emitted from the inspection sample 9; and a comparator 504 that compares the electric field intensity of the terahertz wave LT1 emitted from the inspection sample 9 to an evaluation reference value SV1. The evaluation reference value SV1 is a value (for example, 90% of a saturation value) smaller than an absolute value of the saturation value T<Sat1>or T<Sat2>of the electric field intensity of the terahertz waveLT1, the terahertz wave LT1 being generated by irradiating a reference sample 9A, which is a reference of the inspection sample 9, with the light LP11 while different voltages are applied to the reference sample 9.

Anmelder

Firmen

SCREEN Holdings Co., Ltd.
National Institute of Advanced Industrial Science and Technology

Land

🇯🇵 Japan

Fachgebiete