Substratbehandlungsvorrichtung und Substratbehandlungsverfahren

Details

Veröffentlichungs-Nr.

EP3249682

Aktenzeichen

EP17172339

Anmeldetag

23. Mai 2017

Veröffentlichung

24. August 2022

Erteilung

24. August 2022

Rechtsraum

EP

IPC

H01L21/02H01L21/306H01L21/67

Abstract

Disclosed is a substrate treating apparatus including the following units: a supplying unit which supplies a process liquid including a sublimable substance in a melt state on a pattern-formed surface of a substrate W; a solidifying unit which solidifies the process liquid on the pattern-formed surface to produce a solidified body; and a sublimating unit which sublimates the solidified body to remove the solidified body from the pattern-formed surface. In this apparatus, the sublimable substance includes a fluorinated carbon compound.

Anmelder

Firma

SCREEN Holdings Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete