Musterbelichtungsvorrichtung, Belichtungskopf und Musterbelichtungsverfahren

Details

Veröffentlichungs-Nr.

EP3293576

Aktenzeichen

EP17185142

Anmeldetag

7. August 2017

Veröffentlichung

19. Juli 2023

Erteilung

19. Juli 2023

Rechtsraum

EP

IPC

G03F9/00G03F7/20

Abstract

A technology of excellently performing focusing of patterned light is provided. A pattern exposure device includes an exposure head configured to output patterned light to a photosensitive material surface of a substrate, a measurement device configured to measure the position of the substrate, and a focus control unit configured to adjust an imaging position of the patterned light in accordance with the position of the photosensitive material surface of the substrate. The exposure head includes a lens moving unit configured to move a second lens of a first imaging optical system and a micro lens array in directions toward and away from a first lens.

Anmelder

Firma

SCREEN Holdings Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete