Verfahren zur Herstellung eines Metall-Keramik-Substrats mit Getrimmten Widerständen sowie Metall-Keramik-Substrat mit Getrimmten Widerständen
Anmelder: Infineon Technologies AG 🇩🇪
Details
- Veröffentlichungs-Nr.
- EP3456698
- Aktenzeichen
- EP17190803
- Anmeldetag
- 13. September 2017
- Veröffentlichung
- 16. November 2022
- Erteilung
- 16. November 2022
- Rechtsraum
- EP
- IPC
- C04B37/02B23K26/0622B23K26/351H01L49/02H01C17/242B23K26/03H05K3/02H05K1/16H05K1/03H05K1/02B23K26/00B23K26/082B23K26/361B23K26/40B23K101/38B23K103/12
Abstract
The invention relates to a method for manufacturing a metal-ceramic substrate (10), including providing a central ceramic insulation layer (20) with a conductive metal layer (30) on one or both of its surfaces. Laser ablation with an ultrashort pulse laser is performed on at least one conductive metal layer (30) locally within an ablation area (31) until a certain resistivity of the conductive metal layer (30) is achieved in this ablation area (31). Thereby, the thickness of the conductive metal layer (30) in the ablation area (31) is reduced to a value above zero so that certain resistance values can be achieved in order to form resistors on the metal-ceramic substrate (10). The invention also relates to a corresponding metal-ceramic substrate which has been manufactured by such method. In particular, the conductive metal layer (30) is made of copper which is applied to the central ceramic layer (20) by means of a DCB process to form a DCB substrate.
Anmelder
- Firma
- Infineon Technologies AG
- Land
- 🇩🇪 Deutschland
Deutscher Halbleiterkonzern mit Sitz in Neubiberg bei München, hervorgegangen aus Siemens. Entwickelt und fertigt Halbleiter und Systemlösungen für Automobil-, Industrie- und Sicherheitsanwendungen.
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