Fotomaskenrohling, Verfahren zur Herstellung einer Fotomaske sowie Fotomaske

Details

Veröffentlichungs-Nr.

EP3575870

Aktenzeichen

EP19175849

Anmeldetag

22. Mai 2019

Veröffentlichung

28. Oktober 2020

Erteilung

28. Oktober 2020

Rechtsraum

EP

IPC

G03F1/32G03F1/58G03F1/46

Abstract

Provided is a photomask blank including, on a substrate, a processing film and a film made of a material containing chromium which is formed to be in contact with the processing film and has a three-layer structure of first, second and third layers, each of which contains chromium, oxygen, and nitrogen, wherein the first layer has a chromium content of 40 atomic% or less, an oxygen content of 50 atomic% or more, a nitrogen content of 10 atomic% or less, and a thickness of 20 nm or more, the second layer has a chromium content of 50 atomic% or more, an oxygen content of 20 atomic% or less, and a nitrogen content of 30 atomic% or more, and the third layer has a chromium content of 40 atomic% or less, an oxygen content of 50 atomic% or more, and a nitrogen content of 10 atomic% or less.

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete