Verfahren zur Implantation von Spezies in ein Substrat in Verschiedene Tiefen

Details

Veröffentlichungs-Nr.

EP3742476

Aktenzeichen

EP19175280

Anmeldetag

20. Mai 2019

Veröffentlichung

6. November 2024

Erteilung

6. November 2024

Rechtsraum

EP

IPC

H01L21/265

Abstract

A method of implanting an implant species into a substrate at different depths is described. The method includes forming an implant mask over the substrate. The implant mask includes a first implant zone designed as an opening and a second implant zone designed as a block array. The implant species is implanted through the implant mask under an implant angle tilted against a block plane. Thereby, a first implant area is formed by the implant species at a first depth in the substrate beneath the first implant zone, and a second implant area is formed by the implant species at a second depth in the substrate beneath the second implant zone. The first depth is greater than the second depth.

Anmelder

Firma

Infineon Technologies AG

Land

🇩🇪 Deutschland

Fachgebiete