Elektronenquelle mit Hoher Helligkeit

Details

Veröffentlichungs-Nr.

EP3848953

Aktenzeichen

EP20150403

Anmeldetag

7. Januar 2020

Veröffentlichung

14. Juli 2021

Rechtsraum

EP

IPC

H01J37/28H01J37/06H01J37/073

Abstract

Systems and methods for enhancing inspection throughput with a high brightness electron source are described. A plurality of pulsed constituent electron beams are generated. In some embodiments, generating the constituent electron beams comprises causing energy spread in individual beams. The plurality of pulsed constituent electron beams are combined into a combined electron inspection beam using a deflecting cavity. The combined electron inspection beam has a greater brightness than each of the individual constituent pulsed electron beams. In some embodiments, the combined electron inspection beam is passed through a curved path such as a chicane and then accelerated. In some embodiments, a spherical aberration associated with the electron inspection beam is corrected with a multipole corrected. A substrate may be inspected with the combined electron inspection beam. The greater brightness and/or other characteristics of the combined electron inspection beam enhances the inspection throughput.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete