Verfahren und System zur Messung der Höhe

Details

Veröffentlichungs-Nr.

EP3923078

Aktenzeichen

EP20179379

Anmeldetag

10. Juni 2020

Veröffentlichung

15. Dezember 2021

Rechtsraum

EP

IPC

G03F9/00G03F7/20

Abstract

The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map form the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete