Manipulator, Manipulatoranordnung, Geladenes Teilchenwerkzeug, Mehrstrahliges Teilchenwerkzeug und Verfahren zum Manipulieren eines Geladenen Teilchenstrahls
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP3923315
- Aktenzeichen
- EP20179514
- Anmeldetag
- 11. Juni 2020
- Veröffentlichung
- 24. Januar 2024
- Erteilung
- 24. Januar 2024
- Rechtsraum
- EP
- IPC
- H01J37/12H01J37/147H01J37/153H01J37/28H01J37/317
Abstract
A manipulator for manipulating a charged particle beam in a projection system, the manipulator comprising a substrate having opposing major surfaces in each of which is defined an aperture and a through-passage having an interconnecting surface extending between the apertures; wherein the interconnecting surface comprises one or more electrodes; the manipulator further comprising a potential divider comprising two or more resistive elements connected in series, the potential divider comprising an intermediate node between each pair of adjacent resistive elements, wherein at least one resistive element is formed within the substrate so as to extend between the opposing major surfaces; wherein the intermediate node is electrically connected to at least one of the one or more electrodes.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven