Verfahren zur Korrektur von Out-Of-Band-Lecks und Metrologie-Apparat
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4170429
- Aktenzeichen
- EP21203532
- Anmeldetag
- 19. Oktober 2021
- Veröffentlichung
- 26. April 2023
- Rechtsraum
- EP
- IPC
- G03F7/20G01N21/956
Abstract
Disclosed is method of correcting a metrology image for an out-of-band leakage signal contribution resultant from leakage of measurement radiation at suppressed wavelengths. The method comprises: obtaining at least one correction image, said correction image obtained using measurement radiation with all wavelengths or wavelength bands maximally suppressed by a radiation modulation device; obtaining a metrology image using measurement radiation comprising modulated broadband radiation, modulated by the radiation modulation device to obtain a configured spectrum; and using the at least one correction image to correct the metrology image.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven