Verfahren und Vorrichtung zur Maskenreparatur

Details

Veröffentlichungs-Nr.

EP4250005

Aktenzeichen

EP23163531

Anmeldetag

22. März 2023

Veröffentlichung

25. Juni 2025

Erteilung

25. Juni 2025

Rechtsraum

EP

IPC

G03F1/22G03F1/74

Abstract

The present disclosure relates to methods, to an apparatus and to a computer program for processing of a lithography object. More particularly, the present invention relates to a method for removing a material, to a corresponding apparatus and to a method for lithographic processing of a wafer, and to a computer program for performing the methods. A method for processing a lithography object comprises, for example: providing a first gas comprising first molecules; providing a particle beam in a working region of the object for removal of a first material in the working region based at least partly on the first gas, wherein the first material comprises ruthenium.

Anmelder

Firma

Carl Zeiss SMT GmbH

Land

🇩🇪 Deutschland

Fachgebiete