Ausrichtungsverfahren und Zugehörige Ausrichtungs- und Lithographische Vorrichtungen

Details

Veröffentlichungs-Nr.

EP4379466

Aktenzeichen

EP22210353

Anmeldetag

29. November 2022

Veröffentlichung

5. Juni 2024

Rechtsraum

EP

IPC

G03F7/20G03F9/00

Abstract

Disclosed is a method of correcting position measurement data for an effect of a scan offset, the method comprising: obtaining position measurement data relating to an obliquely scanned measurement along an oblique scan direction over one or more alignment marks, each said one or more alignment marks comprising one or more first direction sub-marks for measurement in a first direction and one or more second direction sub-marks for measurement in a second direction different from said first direction; determining a signal amplitude imbalance metric from said position measurement data, the signal amplitude imbalance metric comprising a ratio of a signal amplitude metric in the first direction to a signal amplitude metric in the second direction; and correcting said position measurement data using said signal amplitude imbalance metric.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete