Reflektierender Maskenrohling und Herstellungsverfahren für Reflektierende Maske

Details

Veröffentlichungs-Nr.

EP4443235

Aktenzeichen

EP24164620

Anmeldetag

19. März 2024

Veröffentlichung

8. Januar 2025

Rechtsraum

EP

IPC

G03F1/24G03F1/48G03F1/58

Abstract

In a reflective mask blank including a substrate, a multilayer reflection film, a protection film, an absorber film and a hard mask film, the protection film is composed of a material containing ruthenium (Ru), the absorber film consists of a first layer and a second layer, or a first layer, a second layer and a third layer, the first layer has a composition containing tantalum (Ta) and being free of nitrogen (N), the second layer has a composition containing tantalum (Ta) and nitrogen (N), the third layer has a composition containing tantalum (Ta), nitrogen (N) and oxygen (O), and the hard mask film is composed of a material containing chromium (Cr).

Anmelder

Firma

SHIN-ETSU CHEMICAL CO., LTD.

Land

🇯🇵 Japan

Fachgebiete