Metrologieverfahren und -Vorrichtung und Computerprogrammhintergrund

Details

Veröffentlichungs-Nr.

EP4455786

Aktenzeichen

EP23170059

Anmeldetag

26. April 2023

Veröffentlichung

30. Oktober 2024

Rechtsraum

EP

IPC

G03F7/00

Abstract

Disclosed is a method of metrology, comprising: obtaining metrology data relating to one or more targets on a substrate, the metrology data comprising intensity metric data relating to one or more intensity metrics, and phase difference metric data relating to a phase difference metric; determining intensity asymmetry metric data from said intensity metric data, said intensity asymmetry metric data describing, for each said intensity metric, an asymmetry in said intensity metric data between diffraction orders of a complementary pair of diffraction orders following diffraction by said one or more targets; obtaining one or more pre-calibrated asymmetry coefficients; and determining a value for a parameter of interest from said phase difference metric data, and said intensity asymmetry metric data as weighted by said pre-calibrated asymmetry coefficients.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete