Dynamische Potenzialanpassung
Anmelder: Carl Zeiss SMT GmbH 🇩🇪
Details
- Veröffentlichungs-Nr.
- EP4498401
- Aktenzeichen
- EP24191034
- Anmeldetag
- 26. Juli 2024
- Veröffentlichung
- 6. August 2025
- Rechtsraum
- EP
- IPC
- H01J37/20H01J37/28H01J37/30
Abstract
The present disclosure relates to a method for processing and/or examining a sample (100) using a particle beam (E), including the following steps: determining an electrostatic charge state of the sample (100); applying a voltage to an element (H) in surroundings of the sample, based at least in part on the determined electrostatic charge state; wherein the element (H) comprises two or more segments; and/or wherein the element (H) is movable relative to the sample (100).The disclosure also relates to a corresponding computer program and a device.
Anmelder
- Firma
- Carl Zeiss SMT GmbH
- Land
- 🇩🇪 Deutschland
Deutsches Unternehmen der Carl Zeiss Gruppe mit Sitz in Oberkochen, das optische Systeme und Lithographieoptiken für die Halbleiterindustrie entwickelt.
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