Lichtstrahlcharakterisierungssystem

EP4528237 Art B1 18. Februar 2026

Anmelder: Leica Microsystems CMS GmbH 🇩🇪

Details

Veröffentlichungs-Nr.
EP4528237
Aktenzeichen
EP23199001
Anmeldetag
22. September 2023
Veröffentlichung
18. Februar 2026
Erteilung
18. Februar 2026
Rechtsraum
EP
IPC
G01J1/42
Offizieller Volltext

Abstract

A light beam characterization system (100) for characterizing a light beam emitted by a light source (102) is disclosed. The light beam characterization system (100) comprises a detector device (108) comprising at least one detector unit (110, 112) configured to detect the light (L), and a micro-opto-electromechanical system (104) comprising an array of mirrors (106). Each mirror (106) is switchable between a first switching state, in which the mirror (106) reflects the light onto the detector device (108), and at least a second switching state, in which the mirror (106) reflects the light (L) away from the detector device (108). A controller (114) is configured to cause a beam profile measurement to be performed on the light (L) detected by the at least one detector unit (110, 112) while selectively switching the mirrors (106) between the first and second switching states. The light beam characterization system (100) further comprises an optical unit (116) configured to direct the light (L) in form of at least two different input light beams (L1, L2) onto the micro-opto-electromechanical system (104). The controller (114) is configured to cause the beam profile measurement to be performed on each of the at least two input light beams (L1, L2).

Anmelder

Firma
Leica Microsystems CMS GmbH
Land
🇩🇪 Deutschland
🇩🇪 Leica Microsystems

Deutsches Unternehmen für optische und digitale Mikroskopie, entwickelt Mikroskope und Bildgebungssysteme für Forschung, Industrie und medizinische Diagnostik.

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