Belichtungsapparatpositionssteuerung

Details

Veröffentlichungs-Nr.

EP4567514

Aktenzeichen

EP25166653

Anmeldetag

27. März 2025

Veröffentlichung

7. Januar 2026

Rechtsraum

EP

IPC

G03F7/00

Abstract

A method of positioning N modules in an exposure apparatus, wherein N > 2, the method comprises controlling a position of each of the N modules, comprising, for at least one of the N modules, feeding through a position error of the at least one of the N modules to at least two other ones of the N modules. The feeding through comprises multiplying the position errors by a feed through filter matrix, wherein a non-diagonal term in the feed through filter matrix provides a feed through parameter from an error signal of a respective one of the N modules to another one of the N modules.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete