Ganzheitliche Kalibrierung

EP4571418 Art A1 18. Juni 2025

Anmelder: ASML Netherlands B.V. 🇳🇱

Details

Veröffentlichungs-Nr.: EP4571418
Aktenzeichen: EP23215687
Anmeldetag: 11. Dezember 2023
Veröffentlichung: 18. Juni 2025
Rechtsraum: EP
IPC: G03F7/20

Abstract

A method is provided for measuring a characteristic feature or property of a sub-target (e.g., a component of an integrated circuit, IC, fabricated using a lithography production process). The sub-target is located on a target, which includes one or more other sub-targets. The method involves arranging each of the sub-targets in a plurality of disjunct positions within an illumination spot of electromagnetic radiation and measuring the intensity of electromagnetic radiation diffracted from each of the sub-targets at those respective positions. Corrected intensities of electromagnetic radiation diffracted by the corresponding sub-target are determined.

Anmelder

Firma: ASML Netherlands B.V.
Land: 🇳🇱 Niederlande

🇳🇱 ASML

Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.

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Fachgebiete

Optik & Fototechnik

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