Positionsmesssystem, Projektionssystem, Belichtungsvorrichtung und Verfahren zur Messung einer Position eines Objekts

Details

Veröffentlichungs-Nr.

EP4585881

Aktenzeichen

EP25176808

Anmeldetag

15. Mai 2025

Veröffentlichung

17. Dezember 2025

Rechtsraum

EP

IPC

G01B9/02018G01B9/02056G03F7/00

Abstract

The invention provides a position measurement system, comprising:a light source to provide a measurement beam and a reference beam propagating along a common light beam path,an optical device located in the common light beam path and downbeam of the light source, wherein the optical device is configured to induce or adjust an offset between the measurement beam and the reference beam,interferometer optics downbeam of the optical device, the interferometer optics configured to propagate the measurement beam in multiple passes along measurement paths to a measurement surface and the reference beam in multiple passes along reference paths to a reference surface,a detector to receive a reflected measurement beam and a reflected reference beam after a final pass of the multiple passes,wherein a reflective surface in the measurement paths or the reference paths is tilted, such that an incident angle of the measurement beam or reference beam incident on the respective reflective surface is at a non-90 degrees angle and at a non-45 degrees angle with respect to the reflective surface.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete