Substrat, Lithographisches Verfahren und Metrologieverfahren

Details

Veröffentlichungs-Nr.

EP4600737

Aktenzeichen

EP25166452

Anmeldetag

26. März 2025

Veröffentlichung

10. Dezember 2025

Rechtsraum

EP

IPC

G03F7/00

Abstract

Disclosed is a substrate, associated patterning device and metrology method. The substrate comprises one or more first metrology targets for measuring a parameter of interest in one or more measurement directions, each said one or more first metrology targets comprising at least one first-type sub-target and at least one second-type sub-target; and one or more second metrology targets, wherein each said second metrology target is similar to each said first metrology target, but with the first-type sub-targets swapped in position with the second-type sub-targets of the same measurement direction for at least one measurement direction of said one or more measurement directions.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete