System zur Messung von Wellenfrontaberrationen und Belichtungsvorrichtung
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4600738
- Aktenzeichen
- EP25184990
- Anmeldetag
- 24. Juni 2025
- Veröffentlichung
- 13. August 2025
- Rechtsraum
- EP
- IPC
- G03F7/00
Abstract
A wavefront aberration measurement system for determining aberrations of a projection system is described, the system comprising: a first 2 dimensional grating, a second 2 dimensional grating, a radiation source configured to irradiate the first 2 dimensional grating, and a detector configured to detect radiation from the radiation source having in sequence interacted with the first 2 dimensional grating, the projection system and the second 2 dimensional grating and The system further comprises a control device configured to perform phase stepping by moving the first 2 dimensional grating and the second 2 dimensional grating in respect of each other along a diagonal of the first 2 dimensional grating and the second 2 dimensional grating with an alignment phase difference between the X-direction and the Y-direction, thereby obtaining detector data.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven