Hybride Mehrwellenlängenabtastung für Genauigkeitsverbesserungen
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4600740
- Aktenzeichen
- EP25186484
- Anmeldetag
- 30. Juni 2025
- Veröffentlichung
- 11. März 2026
- Rechtsraum
- EP
- IPC
- G03F7/00
Abstract
There is provided a method of predicting a parameter of interest (POI) for each target of a first set of targets formed by a patterning process on a substrate comprising a plurality of targets comprising the first set of targets and a second set of targets. The method comprises obtaining i) a first dataset comprising, for each target of the second set, a respective POI value generated from metrology data obtained by a first metrology process, ii) obtaining a second dataset comprising, for each target of the first set and each target of the second set, a respective POI value generated from metrology data obtained by a second metrology process, and iii) processing the first dataset and the second dataset to predict the respective POI value for each target of the first set, wherein the predicted value is a prediction of the POI generated from metrology data obtained by applying the second metrology process to the first set of targets.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven