Verfahren zur Bestimmung einer Luftbildposition und Lithographische Vorrichtung

Details

Veröffentlichungs-Nr.

EP4607276

Aktenzeichen

EP25187778

Anmeldetag

7. Juli 2025

Veröffentlichung

11. März 2026

Rechtsraum

EP

IPC

G03F7/00G03F9/00

Abstract

The disclosure provides a method of determining an aerial image position using at least one sensor on a substrate table of a lithographic apparatus, the method comprising: performing a first alignment measurement at a measure station of the lithographic apparatus to determine a position of the substrate relative to the at least one sensor; determining a first temperature of the at least one sensor during the first alignment measurement; performing a second alignment measurement at the expose station to determine a position of an aerial image of a reticle mark with respect to the at least one sensor; anddetermining a second temperature of the at least one sensor during the second alignment measurement. The method includes correcting the second alignment measurement based on a difference between the first temperature and the second temperature.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete