Messungsladungsentfernung und Schichtweise Stapelgeometrieinferenz unter Verwendung von Diffusionsmodellen

Details

Veröffentlichungs-Nr.

EP4607453

Aktenzeichen

EP25171537

Anmeldetag

21. April 2025

Veröffentlichung

19. November 2025

Rechtsraum

EP

IPC

G06T5/73G06T5/50G06T5/60G06T5/80G06T7/00G06T7/60

Abstract

A method of updating images taken by charged-particle beam (CPB) tool of a feature of a wafer. The method includes generating a distortion map by a machine learning model trained on: a first CPB image of the feature, wherein the first image has a first resolution; a second CPB image of the feature, wherein the second image has a second resolution different from the first resolution and the second CPB image includes distortions; and a mask based on the first CPB image. The distortion map indicates how the second CPB image is distorted relative to the feature. A third image of the feature is generated by applying the distortion map to the second CPB image, wherein the third image has a third resolution higher than the first resolution and is used for performing metrology or defect detection.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete