Strahlungsquellengehäuse und Kollektor

Details

Veröffentlichungs-Nr.

EP4636479

Aktenzeichen

EP24170719

Anmeldetag

17. April 2024

Veröffentlichung

22. Oktober 2025

Rechtsraum

EP

IPC

G03F7/00H05G2/00

Abstract

A radiation source comprising a source of target material configured to direct target material to a plasma formation location, and a laser system configured to direct an infrared laser beam onto the target material at the plasma formation location to generate EUV radiation, wherein the radiation source further comprises a housing with an opening through which EUV radiation may exit the radiation source, wherein the radiation source is configured such that a first portion of the housing receives a majority of the infrared radiation beam when the infrared radiation beam is not incident upon a target material, and wherein the first portion of the housing is configured to reflect the infrared radiation to other portions of the housing which are further away from the opening of the housing.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete