Belichtungsvorrichtung und Verfahren zur Durchführung eines Lithografischen Belichtungsverfahrens
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4650872
- Aktenzeichen
- EP25205718
- Anmeldetag
- 30. September 2025
- Veröffentlichung
- 19. November 2025
- Rechtsraum
- EP
- IPC
- G03F7/00
Abstract
An exposure apparatus configured to perform a lithographic exposure process, comprising an actuator, and a control unit configured to control the actuator, the control unit comprising a trained machine learning model. The control unit is configured to determine, within a predetermined amount of time, a control setting for controlling the actuator by: obtaining a desired correction of the lithographic exposure process; determining an initial control setting for the actuator based on the desired correction of the lithographic exposure process; and iteratively refining the initial control setting to approach the desired correction of the lithographic exposure process, thereby obtaining the control setting for the actuator. The control unit is configured to determine the initial control setting for the actuator by providing the desired correction of the lithographic exposure process as input to the trained machine learning model.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven