Verfahren und Vorrichtung zur Passivierung der Seitenwand des Schwarzen Randes auf Extrem-Ultraviolett-Fotomasken

Details

Veröffentlichungs-Nr.

EP4711847

Anmeldetag

7. Juli 2025

Veröffentlichung

18. März 2026

Rechtsraum

EP

IPC

G03F1/24, G03F1/48

Abstract

The present disclosure generally relates to a method that includes providing a photomask, wherein the photomask includes a trench defined by two sidewalls which are exposed, introducing the photomask into a controlled environment, and directing (i) one or more reactive gases, (ii) a laser, (iii) one or more reactive gases and a laser, or (iv) one or more reactive gases and an electron beam, to the two sidewalls to render a passivation layer adjacent to and in contact with each sidewall. An apparatus and the photomask are also described.

Anmelder

Firma

Intel Corporation

Land

🇺🇸 USA

Fachgebiete