Copolymer, Polymer für Wasserabweisendes Mittel, Zusammensetzung zur Bildung eines Wasserabweisenden Films, Harzfilm und Verfahren zur Bildung einer Resiststruktur
Anmelder: Central Glass Company, Limited 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP4714990
- Anmeldetag
- 31. Mai 2024
- Veröffentlichung
- 5. Dezember 2024
- Rechtsraum
- EP
Abstract
Provided is a polymer capable of forming a resin film exhibiting low hysteresis with respect to an immersion fluid and low sliding angle in liquid immersion lithography. A copolymer of the present disclosure contains a repeating unit derived from a compound having a polymerizable carbon-carbon double bond, and a repeating unit of the formula (1):wherein R<sup>1</sup> is a hydrogen, fluorine, or chlorine atom, or a C1-C10 linear or C3-C10 branched alkyl group, some or all of the hydrogen atoms bonded to the carbon atoms in the alkyl group being optionally replaced by fluorine atoms; R<sup>2</sup> is a single bond, an alkylene group optionally having a linear, branched, or cyclic structure, an aromatic ring, an ester, a carbonyl, an ether, an amide, an amine, or a composite substituent thereof, a part of which is optionally fluorinated and/or chlorinated; and X is a hydroxy or alkoxy group, or a hydrogen atom.
Anmelder
- Firma
- Central Glass Company, Limited
- Land
- 🇯🇵 Japan
Japanisches Unternehmen mit Sitz in Tokio, das Flachglas, Spezialglas sowie Fluorchemikalien für Industrie und Bauwesen herstellt.
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