Komplementäre Gate-Schneidstecker zur Belastungsoptimierung
Anmelder: INTEL Corporation 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP4716409
- Anmeldetag
- 1. August 2025
- Veröffentlichung
- 25. März 2026
- Rechtsraum
- EP
Abstract
An integrated circuit (IC) device having complementary dielectric plugs separating gate electrodes. An IC device includes a first gate-cut plug of silicon and nitrogen between and in contact with two gate structures of transistors of a first conductivity type and a second gate-cut plug between and in contact with two gate structures of transistors of a second conductivity type, complementary to the first conductivity type, and the second gate-cut plug has within a liner of silicon and nitrogen either an airgap or a dielectric of silicon and oxygen. Pairs of gate structures of transistors having both of the first and second conductivity types are separated by first and second gate-cut plugs.
Anmelder
- Firma
- INTEL Corporation
- Land
- 🇺🇸 USA
US-amerikanischer Halbleiterhersteller mit Sitz in Kalifornien. Entwickelt und produziert Prozessoren, Chipsätze sowie weitere Halbleiterkomponenten für Computer, Server und eingebettete Systeme.
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