Substratvorrichtung

Details

Veröffentlichungs-Nr.

EP4718159

Anmeldetag

30. September 2024

Veröffentlichung

1. April 2026

Rechtsraum

EP

IPC

G03F9/00, H01L21/683, G03F7/00

Abstract

A substrate device for being held by an electrostatic clamp, the substrate device having a bottom side configured to face a substrate support surface of the clamp in use, the substrate device comprising a plasma generating part configured to form a plasma space between a first portion of the bottom side and an associated first portion of the substrate support surface of the clamp, wherein the plasma generating part is configured to generate a plasma within the plasma space, and a connection part electrically connected to the plasma generating part and configured to provide an electrically conductive connection between one or more substrate conductors provided on a second portion of the bottom side and one or more clamp conductors on the clamp during use.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete