Speicher mit Ferroelektrischen oder Antiferroelektrischen Kondensatoren und Dioden in Gestapelten Konfigurationen
Anmelder: INTEL Corporation 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP4718972
- Anmeldetag
- 8. August 2025
- Veröffentlichung
- 1. April 2026
- Rechtsraum
- EP
Abstract
An integrated circuit die includes a first surface having conductive features and a second surface opposite the first surface. A device layer is proximate the first surface and includes a plurality of transistors. The device layer is between a memory layer and the first surface. The memory layer includes memory circuitry having a plurality of memory cells memory cells arranged in a cross-bar array. Each memory cell comprises first and second diodes, and a capacitor. Each diode includes an insulator material between electrodes. In some embodiments, the first and second diodes share an electrode. The capacitor includes a ferroelectric or an antiferroelectric material between electrodes.
Anmelder
- Firma
- INTEL Corporation
- Land
- 🇺🇸 USA
US-amerikanischer Halbleiterhersteller mit Sitz in Kalifornien. Entwickelt und produziert Prozessoren, Chipsätze sowie weitere Halbleiterkomponenten für Computer, Server und eingebettete Systeme.
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