Lithographisches Projektionsverfahren und Lithographische Vorrichtung

Details

Veröffentlichungs-Nr.

EP4722807

Anmeldetag

2. Oktober 2024

Veröffentlichung

8. April 2026

Rechtsraum

EP

IPC

G03F7/00

Abstract

The disclosure provides a lithography projection method, comprising:providing a radiation beam,imparting the radiation beam with a pattern of a patterning device in its cross-section to form a patterned radiation beam,projecting the patterned radiation beam on multiple exposure fields of a substrate,wherein imparting the radiation beam with the pattern of the patterning device comprises moving the patterning device with a scanning movement in a scanning direction with respect to an exposure slit mainly extending in a slit direction perpendicular to the scanning direction,wherein the lithography projection method further comprises:splitting in the slit direction at least one of the multiple exposure fields in two or more partial exposure fields, andprojecting the patterned radiation beam on the two or more partial exposure fields in two or more separate scanning movements of the patterning device in the scanning direction.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande