Verfahren zur Bestimmung eines Parameters in Zusammenhang mit einer Flüssigkeitshandhabungsstruktur Und/oder mit Benetzbarkeit eines Substrats in Immersionslithographie, Entsprechendes Verfahren zur Herstellung einer Vorrichtung in einer Lithographischen Einrichtung und Entsprechende Lithographische Einrichtung

Details

Veröffentlichungs-Nr.

EP4722813

Anmeldetag

7. Oktober 2024

Veröffentlichung

8. April 2026

Rechtsraum

EP

IPC

G03F7/20(ASML NETHERLANDS BV et al.)

Abstract

The present disclosure relates to methods for a lithographic apparatus comprising a fluid handling structure configured to confine a fluid to a region of a surface of a substrate. The methods are for determining a parameter associated with the fluid handling structure and/or the wettability of the substrate. Some methods comprise causing a movement of the fluid handling structure relative to the substrate, wherein a speed of the fluid handling structure relative to the substrate during the movement varies as a function of the position of the fluid handling structure relative to the substrate; and then inspecting the surface of the substrate, or wherein the fluid handling structure passes over a fluid-pinning feature during the movement of the fluid handling structure relative to the substrate; and then inspecting the surface of the substrate, or determining a thermal load on the substrate.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande