Isoliergas für Hochspannungskomponente von Elektronenmikroskopen

Details

Veröffentlichungs-Nr.

EP4726768

Anmeldetag

8. Oktober 2025

Veröffentlichung

15. April 2026

Rechtsraum

EP

Abstract

Provided herein is a charged particle system 200, comprising a charged particle source system comprising a high voltage component 202, 204, 206 housed within a high voltage component volume defined by the charged particle source system, wherein the charged particle source system is configured to generate a charged particle beam, wherein an insulation gas occupies the high voltage component volume, and wherein the insulation gas comprises a mixture of a trifluoro gas and at least one other gas selected from the group consisting of atmospheric air, oxygen (O2), carbon dioxide (CO2), and nitrogen (N2); a sample chamber 208 comprising a stage configured to support a sample; and a charged particle beam column 210 configured to direct the charged particle beam towards the sample. Further provided herein is a method of using an insulation gas in a high voltage component of an electron particle system.

Anmelder

Firma

FEI COMPANY

Land

🇺🇸 USA