Digitales Schreiben von Grossen Beugungsgittermustern

Details

Veröffentlichungs-Nr.

EP4730019

Anmeldetag

14. Januar 2020

Veröffentlichung

22. April 2026

Rechtsraum

EP

IPC

G02B27/42

Abstract

A substrate (40, 70, 90, 220) comprises a first planar surface (46, 92) and a second planar surface (46, 92). A first diffraction pattern is arranged along one of said first and second planar surfaces (46, 92), wherein said first diffraction pattern includes a first plurality of diffractive features (50). A second diffraction pattern is arranged along one of said first and second planar surfaces (46, 92), wherein said second diffraction pattern includes a second plurality of diffractive features (50). At least one of said first and second pluralities of diffractive features (50) comprise stepped line diffractive features (52). A virtual image near-eye display system comprises at least one planar waveguide including the substrate (40, 70, 90, 220). A beam writing system comprises a first platform operable to translate in x and y directions and a second platform operable to rotate about a perpendicular axis, wherein the substrate (40, 70, 90, 220) is coupled to the beam writing system.

Anmelder

Firma

Vuzix Corporation

Land

🇺🇸 USA

Fachgebiete