Gasströmungsvorrichtung und Verfahren zur Verwendung in einem Optischen System

EP4730032 22. April 2026

Anmelder: ASML Netherlands B.V. 🇳🇱

Details

Veröffentlichungs-Nr.
EP4730032
Anmeldetag
16. Oktober 2024
Veröffentlichung
22. April 2026
Rechtsraum
EP
IPC
G03F7/00, G02B27/00(MORGAN JOHN H et al.)(PENNEY CARL M et al.)
Offizieller Volltext

Abstract

A gas flow apparatus for use in an optical system comprising an optical element defining an optical surface, wherein the gas flow apparatus comprises a structure that is arranged to define an enclosure that is partially closed by the optical surface, when the gas flow apparatus is in use. The structure defines an aperture for radiation to propagate to or from the optical surface. A gas system is provided to provide a gas into the enclosure defined by the structure. Herewith, at least a portion of the gas is directed to swirl about an optical axis of the optical element. The gas has a component of velocity directed from the optical surface towards the aperture defined by the structure. A gas extractor may be arranged to extract gas from a volume that is in fluid communication with the optical surface. At least a portion of the gas is directed to swirl about a direction of net flow of the gas as it exits the volume.

Anmelder

Firma
ASML Netherlands B.V.
Land
🇳🇱 Niederlande
🇳🇱 ASML

Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.

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