Nanobandbasierte Vorrichtung mit Separaten Gate- und Source- oder Drainkontakten
Anmelder: INTEL Corporation 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP4730958
- Anmeldetag
- 22. September 2025
- Veröffentlichung
- 22. April 2026
- Rechtsraum
- EP
- IPC
- (LEE KYEN-HEE et al.)(RACHMADY WILLY et al.)(TOKYO ELECTRON LTD et al.)
Abstract
Nanoribbon-based devices with separate gate, source, and/or drain contacts can enable forming multiple devices having one or more independent contacts from different nanoribbons in a stack. In one example, an integrated circuity structure includes a stack of two or more nanoribbons, a gate electrode material at least partially around portions of the two or more nanoribbons, and source or drain regions, where discontinuities (e.g., including an insulator material) may be present between portions of the gate electrode material and/or between portions of the source or drain regions. Independent contact structures may be coupled with the separate portions of the gate electrode material and/or with the separate portions of the source or drain regions.
Anmelder
- Firma
- INTEL Corporation
- Land
- 🇺🇸 USA
US-amerikanischer Halbleiterhersteller mit Sitz in Kalifornien. Entwickelt und produziert Prozessoren, Chipsätze sowie weitere Halbleiterkomponenten für Computer, Server und eingebettete Systeme.
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