Optische Anordnung für Geladene Teilchen in einem Teilchenstrahlapparat
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4734147
- Anmeldetag
- 24. Oktober 2024
- Veröffentlichung
- 29. April 2026
- Rechtsraum
- EP
- IPC
- H01J37/147, H01J37/28(CANON KK et al.)
Abstract
The present disclosure relates to a charged particle-optical element for a charged particle beam apparatus, wherein the charged particle-optical element is configured to operate on a plurality of beamlets of charged particles, and the charged particle-optical element comprises: a first electrode, wherein a plurality of first apertures for passage of the plurality of beamlets are defined in a beam area of the first electrode; and a second electrode, wherein a plurality of second apertures for passage of the plurality of beamlets are defined in a beam area of the second electrode, wherein the first electrode is configured to adopt a target curved profile upon application of a potential difference between the first electrode and the second electrode.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven