Verfahren zur Lithographie auf einem Rekonstituierten Substrat mit Positionskorrektur

Details

Veröffentlichungs-Nr.

EP4738012

Anmeldetag

1. November 2024

Veröffentlichung

6. Mai 2026

Rechtsraum

EP

IPC

G03F7/20, H01L21/60, H01L21/98

Abstract

Disclosed is a method of determining a correction for performing a lithographic exposure on a reconstituted substrate, said reconstituted substrate comprising a base substrate with a plurality of substrate portions bonded thereto, said substrate portions having been diced from one or more pre-diced substrates The method comprises: obtaining positional data describing a position of features in at least an uppermost layer of said one or more pre-diced substrates; and using said positional data to determine said correction for performing the lithographic exposure on the reconstituted substrate.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete