Reflektierender Fotomaskenrohling und Verfahren zur Herstellung einer Reflektierenden Fotomaske

Details

Veröffentlichungs-Nr.

EP4741920

Anmeldetag

26. September 2025

Veröffentlichung

13. Mai 2026

Rechtsraum

EP

IPC

G03F1/24, G03F1/32(IKEBE YOHEI et al.)

Abstract

A reflective photomask blank including a substrate, a multilayer reflection film, a protection film and a light absorbing film that has a phase shift function is provided. The light absorbing film contains ruthenium and chromium and is free of oxygen and nitrogen, and has a ruthenium content of 5 to 15 at%, a chromium content of 85 to 95 at%, a thickness of 40 to 56 nm, and a reflectance of 2 to 5% and a phase shift of 200 to 230 degrees with respect to exposure light being light in extreme ultraviolet range.

Anmelder

Firma

SHIN-ETSU CHEMICAL CO., LTD.

Land

🇯🇵 Japan