Wellenlängenauswahlsystem
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4741922
- Anmeldetag
- 6. November 2024
- Veröffentlichung
- 13. Mai 2026
- Rechtsraum
- EP
- IPC
- G03F7/00(SAMSUNG ELECTRO MECH et al.)(SMITH STANLEY DESMOND et al.)(HILL ANDREW V et al.)
Abstract
A wavelength selection system comprising an actuatable reflector configured to reflect a radiation beam, and an optical filter configured to receive the reflected radiation beam, wherein the actuatable reflector is moveable between different orientations which direct the radiation beam to different positions on the optical filter, or at different angles of incidence on the optical filter, such that the optical filter selectively filters different wavelengths of the radiation beam, and wherein the wavelength selection system further comprises a dispersive element configured to apply wavelength dispersion to the radiation beam before the radiation beam is incident upon the optical filter.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven