Strahlungsquelle, Euv-Nutzungsvorrichtung und Verfahren
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4741923
- Anmeldetag
- 12. November 2024
- Veröffentlichung
- 13. Mai 2026
- Rechtsraum
- EP
Abstract
There is provided a radiation source comprising a laser system, wherein the laser system is arranged to transport a laser beam from a source to a target region along a beam path, the beam path including at least one optical element in thermal communication with a vapour chamber arranged to distribute thermal energy provided by the laser beam and to cool the optical element in combination with a heat sink. Also provided is an EUV utilization apparatus including the radiation as well as a method of operating the radiation. Also described is the use of such a radiation source, EUV utilization apparatus or method in an EUV utilization method or apparatus.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
3.336 Patente in unserer Datenbank
Vertreten von
-
ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven