Verfahren und System zur Erzeugung von Lithographiemustern
EP4741928
13. Mai 2026
Anmelder: Vestlandets Innovasjonsselskap AS 🇳🇴
Details
- Veröffentlichungs-Nr.
- EP4741928
- Anmeldetag
- 8. März 2023
- Veröffentlichung
- 13. Mai 2026
- Rechtsraum
- EP
- IPC
- G03F7/20
Abstract
A lithography pattern generation system (1) and method comprising - an incoming particle beam (21) with a most probable wavelength (λ) from a particle source (2) and - a mask (4) comprising through holes (3) arranged in the incoming particle beam (21). The lithography pattern generation system (1) generates a single nanometre feature size pattern (51) and wherein the through holes (3) are arranged non-periodically in the mask. A computer implemented method for generating a lithography mask (4) model is also disclosed.
Anmelder
- Firma
- Vestlandets Innovasjonsselskap AS
- Land
- 🇳🇴 Norwegen