Speicherarchitekturen mit Ambipolaren Halbleiterkanälen
Anmelder: MICRON TECHNOLOGY, INC. 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP4742247
- Anmeldetag
- 12. November 2025
- Veröffentlichung
- 13. Mai 2026
- Rechtsraum
- EP
Abstract
Methods, systems, and devices for memory architectures with ambipolar semiconductor channels are described. A memory device may include multiple conductors that are each associated with a respective activation line of a memory array, and a pillar that extends through the conductors. The pillar may include a semiconductor material extending along a length of the pillar and associated with an ambipolar channel along the length of the pillar. The memory device may also include multiple storage portions each including one or more storage materials (e.g., to store a charge, a dipole polarization, or a combination thereof). Each storage portion may be associated with a respective memory cell of the memory array and may be positioned between a respective one of the conductors and a respective portion of the semiconductor material along the length of the pillar.
Anmelder
- Firma
- MICRON TECHNOLOGY, INC.
- Land
- 🇺🇸 USA
US-amerikanisches Halbleiterunternehmen mit Sitz in Boise, Idaho. Micron entwickelt und fertigt Speicherchips wie DRAM und NAND-Flash sowie Speicherlösungen für Computer, Mobilgeräte, Rechenzentren und Automobile.
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Marks & Clerk LLP
Marks & Clerk LLP · Luxembourg